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Bipolar HiPIMS regulate ion energy during film growth

利用HiPIMS制備出的Ti-Si-N薄膜硬度可以達(dá)到66GPa！

What does PVD preprocessing do to clean up?

DLC film was deposited in the long tube by pulsed DC PECVD process

HiPIMS tool New application - high entropy alloy film manufacturing

Introduction of High-power Pulsed Magnetron Sputtering Technology (Part 2)

What is the principle of vacuum coating?

Physical vapor deposition technology refers to the use of various physical methods, under vacuum conditions vaporization into atoms and molecules or ionization into ions, electroplating materials directly deposited on the surface of the substrate.

Characteristics of vacuum coating

Compared with wet coating technology, vacuum coating technology has the following advantages:

(1) The selection of film material and substrate material is wide, the film thickness can be controlled, and a variety of functional films with different functions can be prepared.